C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/308, 71/8.2
C07D 277/34 (2006.01) A01N 43/74 (2006.01) A01N 43/82 (2006.01) C07D 271/07 (2006.01) C07D 271/113 (2006.01) C07D 277/56 (2006.01) C07D 285/08 (2006.01) C07D 285/12 (2006.01) C07D 285/125 (2006.01) C07D 285/13 (2006.01)
Patent
CA 1334422
in which A stands for nitrogen or the group C-R3 where R3 stands for halogen, cyano, alkyl, halogenoalkyl, alkoxy, halogenoalkoxy, alkylthio, halogenoalkylthio, alkylsulphinyl or alkylsulphonyl, B stands for nitrogen or the group C-R4 where R4 stands for halogen, cyano, alkyl, halogenoalkyl, alkoxy, halogenoalkoxy, alkylthio, halogenoalkylthio, alkylsulphinyl, halogenoalkylsulphinyl, alkylsulphonyl, halogenoalkylsulphonyl, for phenyl which is optionally substituted by halogen, alkyl, halogenoalkyl, alkoxy or halogenoalkoxy, or for the group -CY2-Z-R5 where R5 stands for alkyl, which is optionally substituted by halogen, alkoxy or alkylthio, or for phenyl which is optionally substituted by halogen, alkyl, halogenoalkyl, alkoxy, halogenoalkoxy, alkylthio or halogenoalkylthio, Y stands for hydrogen or halogen, Z stands for oxygen, sulphur, SO or SO2, R1 stands for hydrogen, halogen, cyano, nitro, alkyl, halogenoalkyl, alkoxy, halogenoalkoxy, alkylthio or halogenoalkylthio, R2 stands for hydrogen, halogen, alkyl, halogenoalkyl or alkoxy and X stands for oxygen or sulphur, excluding the compound N-isopropyl-(5-trifluoromethyl-1,3,4-thiadiazol-2-yl)- oxyacetanilide,
603725
Andree Roland
Forster Heinz
Santel Hans-Joachim
Schmidt Robert R.
Strang Harry
Aktiengesellschaft Bayer
Fetherstonhaugh & Co.
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