Perfluoropolyethers containing a halogen different from...

Details Perfluoropolyethers containing a halogen different from... Perfluoropolyethers containing a halogen different from...

C - Chemistry, Metallurgy

07

C

6/222, 260/527,

C07C 59/135 (2006.01) C08F 2/48 (2006.01) C08G 65/00 (2006.01) C08G 65/32 (2006.01) C08G 65/324 (2006.01) C08G 65/331 (2006.01) C08L 71/00 (2006.01)

Patent

CA 1339425

Perfluoropolyethers having an acid end group of the type of acyl fluoride (or chloride) or a carboxylic group or derivatives thereof, the other end group being a perfluoroalkyl containing one or two halogen atoms different from fluorine, are useful as surfactants or as a protection against atmospheric agents. The polyethers are prepared by photooxidation of C3F6 and/or C2F4 in the presence of a thoroughly halogenated ethylene containing 1 to 4, preferably 1 or 2 atoms of halogen different from fluorine, and by subsequent thermal or photochemical decomposition treatment of the peroxide groups which are present in the photooxidation product.

598194

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