Apparatus for projecting a series of images onto dies of a...

H - Electricity – 01 – L

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356/165

H01L 21/70 (2006.01) G02B 17/08 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1171555

Apparatus for Projecting a Series of Images Onto Dies of a Semiconductor Wafer Abstract The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-one stationary projection optical system projects an image of the reticle pattern onto a predetermined focal plane. Suitable means such as a vacuum chuck holds the wafer. An alignment system steps and orients a wafer chuck to register markings on the individual sides of the wafer with corresponding markings on the reticle. A fluid servo system acts on the chuck to hold at least a portion of the wafer in the predetermined focal plane of the projection optical system.

402964

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