C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/246
C07D 401/04 (2006.01) A61K 31/495 (2006.01) C07D 213/73 (2006.01) C07D 213/82 (2006.01) C07D 239/42 (2006.01) C07D 403/04 (2006.01)
Patent
CA 1337417
The present invention concerns novel compounds of the general formula: Image (I) wherein R1 is halogen or hydrogen and R2 is halogen; X is either oxygen, sulfor or methylene R3 and R4 are the same or different and selected from hydrogen and lower alkyl; n is 2 or 3; A is selected from the following pyrimidyl or pyridyl groups Image wherein R5 is selected from hydrogen, lower alkyl or halogen; R6 and R7 are the same or different and selec- ted from hydrogen, halogen, lower alkyl, electron donor groups such as lower alkoxy or hydroxy, electron accep- tor groups such as cyano, nitro, trifluoromethyl, COOR8, CONR9R10 or CO-B; wherein R8 is hydrogen or lower alkyl; R9 and R10 are the same or different and selected from hydrogen, lower alkyl and cycloalkyl; B is selected from Image wherein m is 1, 2, 3 or 4. R11 is selected from hydrogen or lower alkyl, and the pharmacologically active salts thereof. The new compounds are useful for treating mental disorders.
612932
Abramo Aina Lisbeth
Lundstedt Erik Torbjorn
Nordvi Curt
Olsson Knut Gunnar
Biovitrum Ab
Gowling Lafleur Henderson Llp
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