C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/26
C25D 5/10 (2006.01) C25D 5/12 (2006.01)
Patent
CA 1316483
ABSTRACT OF THE DISCLOSURE The present invention relates to a method for the electrodeposition of an ordered alloy structured in alternate discrete layers, said alloys possessing high elastic modulus and adjustable magnetic susceptibility. The electrodeposition of at least two metals, charac- terized by a redox potential gap of at least 0.1 V between said metals, is obtained by the pulse plating technique with a frequency in the range of 0.02 Hz to 15 Hz. The concentrations of the noblest metal in the electrodepos- ition solution should be in the range of 0.001 M to 2.0 M while that of the less noble metal is about its saturation at room temperature. The discrete layers obtained accor- ding to the method are less than 90 A thickness being substantially pure. Examples of the metals to be electro- deposited according to the invention are copper-nickel; copper palladium; nickel-gold, copper-nickel-iron and corresponding alloys with cobalt or iron replacing nickel.
532645
Yahalom Joseph
Zadok Ori
Mcfadden Fincham
Technion Research & Development Foundation Ltd.
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