C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1
C07D 501/46 (2006.01) A61K 31/34 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 501/02 (2006.01) C07D 501/06 (2006.01) C07D 501/16 (2006.01) C07D 501/20 (2006.01) C07D 501/24 (2006.01) C07D 501/38 (2006.01) A61K 31/45 (2006.01)
Patent
CA 1213883
Abstract of the Disclosure Compounds of the formula Image wherein R1 is hydrogen or a conventional amino-protecting group, R2 and R3 each are independently methyl or ethyl, and R4 is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, allyl, 2-butenyl, 3-butenyl, 2-hydroxyethyl, 3-hydroxypropyl, 2- (dimethylamino)ethyl, pyridylmethyl, pyridylethyl, benzyl or phenethyl, and nontoxic pharmaceutically acceptable acid addition salts and solvates thereof, as well as processes for their preparation, are disclosed. The compounds in which R1 is hydrogen are potent antibacterial agents.
421782
Kamachi Hajime
Naito Takayuki
Okumura Jun
Bristol-Myers Company
Gowling Lafleur Henderson Llp
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