C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/491, 96/71,
C07C 69/736 (2006.01) C07C 59/64 (2006.01) C07C 66/00 (2006.01) C07C 217/62 (2006.01) C07D 307/12 (2006.01) C07D 311/04 (2006.01) C07F 9/40 (2006.01) G03C 7/392 (2006.01)
Patent
CA 1228358
Abstract of the Disclosure Hydroquinone ether compounds New hydroquinone ether compounds of formula I are described: Image (I) wherein p is 1 or 2 and q is 0 or 1, provided that p + q is 1 or 2, R is a residue of formula II Image (II) and R0, R00, R1, R2, R3, Q, n and k are as defined in claim 1. The new compounds are useful e.g. as stabilisers in photographic material.
430359
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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