Resist ink composition

C - Chemistry – Metallurgy – 09 – D

Patent

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400/4206

C09D 11/10 (2006.01) H05K 3/18 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1338252

A resist ink composition suitable for forming a masking pattern resistive against chemical attack by a chemical plating liquor is disclosed which comprises: a phenol novolak epoxy resin having an epoxy equivalent of 170-250; a phenol novolak resin having a softening point of 60- 130 °C; a montmorillonite organic complex such as bentonite ion-exchanged with an organic cation; a curing-accelerating catalyst; and an organic solvent.

604829

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