Radiation sensitive mixture and production of relief patterns

Details Radiation sensitive mixture and production of relief patterns Radiation sensitive mixture and production of relief patterns

G - Physics

03

F

96/150

G03F 7/004 (2006.01)

Patent

CA 1334059

A radiation sensitive mixture suitable for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analogous reaction.

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