Method for cleansing gas and apparatus herefor (ii)

B - Operations – Transporting – 01 – D

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B01D 47/10 (2006.01) B01D 47/02 (2006.01) G21C 9/00 (2006.01)

Patent

CA 1305045

ABSTRACT The gas cleansing arrangement according to the invention comprises a vessel (1) which is partially filled with li- quid and which includes a gas inlet pipe (12) for passing gas to a gas distribution means (14) located beneath the surface (34) of the liquid (32). The gas distributor means, or manifold, includes at least one main distribution pipe (18) which extends from the gas inlet pipe and from which there extend obliquely and downwardly passing trans- verse distribution pipes (26) having arranged thereon up- wardly facing inlet openings (64) for contaminated gas and a lower opening (22) which faces the liquid. The inlet openings are each connected to a venturi device (28) having suction openings (29) facing the liquid (32). The gas is cleansed upon passage through the devices while lowering the pressure at the same time. In accordance with the method of the invention pressurized gas urges an inner liquid surface downwards in the inlet pipe (12) and further downwards in the distribution pipes (26), until the liquid surface reaches and exposes the uppermost inlet opening or openings (64). The gas then flows into respective venturi devices (28) and is forced out therethrough at a pressure corresponding to the height difference between the inner liquid surface (46) and the outlet opening (31) of respective venturi devices (28). In this way full working pressure is obtained immediately. Upon further increases in pressure, the liquid surface (46) is lowered still further so as to expose more gas inlet openings (64), enabling the gas to flow out through associ- ated venturi devices of the gas cleansing arrangement. The gas cleansing arrangement operates fully automatically, both at part loads and full loads, solely with the aid of the pressure of the inflowing gas. (Figure 1)

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