G - Physics – 01 – N
Patent
G - Physics
01
N
73/97
G01N 1/28 (2006.01) C30B 13/00 (2006.01) G01N 1/40 (2006.01) G01N 33/00 (2006.01)
Patent
CA 1319278
TRACE METALS ANALYSIS IN SEMICONDUCTOR MATERIAL ABSTRACT A method for analyzing and quantifying the individual trace metals content of a semiconductor material in the low to sub-parts per billion (ppba) range. The method comprises (A) float-zone refining of a sample of the semiconductor material creating a melt zone containing essentially all the trace metals of the sample; (B) cooling the melt zone to form a solid zone concentrated in trace metals; (C) separating the solid zone concentrated in trace metals from the sample of the semiconductor material; (D) converting the solid zone concentrated in trace metals into a form suitable for trace metals analysis; (E) analyzing the solid zone with known trace metals analytical techniques; and (F) calculating total trace metals from these analytical results. This method can also be applied to the small tip which forms on the side of the solid zone.
600792
Hwang Lydia L.
Mccormick James R.
Gowling Lafleur Henderson Llp
Hemlock Semiconductor Corporation
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