Trace metals analysis in semiconductor material

G - Physics – 01 – N

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

73/97

G01N 1/28 (2006.01) C30B 13/00 (2006.01) G01N 1/40 (2006.01) G01N 33/00 (2006.01)

Patent

CA 1319278

TRACE METALS ANALYSIS IN SEMICONDUCTOR MATERIAL ABSTRACT A method for analyzing and quantifying the individual trace metals content of a semiconductor material in the low to sub-parts per billion (ppba) range. The method comprises (A) float-zone refining of a sample of the semiconductor material creating a melt zone containing essentially all the trace metals of the sample; (B) cooling the melt zone to form a solid zone concentrated in trace metals; (C) separating the solid zone concentrated in trace metals from the sample of the semiconductor material; (D) converting the solid zone concentrated in trace metals into a form suitable for trace metals analysis; (E) analyzing the solid zone with known trace metals analytical techniques; and (F) calculating total trace metals from these analytical results. This method can also be applied to the small tip which forms on the side of the solid zone.

600792

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Trace metals analysis in semiconductor material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Trace metals analysis in semiconductor material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Trace metals analysis in semiconductor material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1268153

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.