C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/228, 260/279
C07D 211/58 (2006.01) C07D 211/66 (2006.01) C07D 401/04 (2006.01) C07D 405/12 (2006.01) C07D 405/14 (2006.01) C07D 409/04 (2006.01) C07D 409/12 (2006.01) C07D 409/14 (2006.01) C07D 417/04 (2006.01)
Patent
CA 1281719
ABSTRACT OF THE DISCLOSURE Compounds arc disclosed of the formula Image optically active isomeric forms thereof, and/or pharma- ceutically acceptable acid addition salts thereof, in which formula: R is selected from the group consisting of phenyl and substituted phenyl wherein the substituents are selected from halogen, cyano, lower-alkoxy, lower-alkyl, lower-alkylenedioxy, halogenated lower-alkyl, lower- alkylthio, or combinations thereof; R1 is selected from a furanyl group, a thienyl group or a group of the formula Image wherein R5 is selected from lower-alkyl, lower-cycloalkyl, halogenated lower-alkyl, phenyl, or phenyl lower-alkyl, and wherein each R6 is independently selected from hydrogen, lower-cycloalkyl or lower-alkyl: P2 is selected from the group consisting of phenyl-lower-alkyl, lower- alkyl, lower-alkenyl, loher-alkynyl, halogenated lower- alkyl, (cycloalkyl)alkyl, thienyl lower-alkyl, thiazolyl lower-alkyl which can be substituted in the 4-position with a methyl group, (4,5-dihydro-5-oxo-1H-tetrazol-1-yl) lower-alkyl which can be substituted in the 4-position with a group selected from lower-alkyl, lower cycloalkyl, aryl or aryl lower-alkyl, and substituted phenyl lower- alkyl in which the substituents on the phenyl ring are selected from halogen, cyano, lower-alkoxy, lower-alkyl, lower-alkylenedioxy, halogenated lower-alkyl, lower- alkylthio or combinations thereof; R3 is selected from a group consisting of hydrogen, methoxymethyl, and a carboxylate radical represented by the formula Image wherein R10 is selected from the group consisting of lower-alkyl, aryl-lower-alkyl, lower-alkoxy-lower-alkyl, and aryloxy-lower-alkyl; and R4 is selected from hydrogen or methyl. Analgesic compositions containing these compounds and methods of using such compounds are also disclosed.
478273
Deutsche Kirsten H.
Huang Bao-Shan
Kudzma Linas V.
Lalinde Nhora L.
Terrell Ross C.
Boc Inc.
Deutsche Kirsten H.
Gowling Lafleur Henderson Llp
Huang Bao-Shan
Kudzma Linas V.
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