C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
117/64
C23C 16/00 (2006.01)
Patent
CA 1251362
Abstract of the Disclosure A method employing an undercoating for the vacuum deposition of material thereover that can be removed from a substrate by washing with water for one minute or less comprising a water soluble film-forming polymer, a solubility accelerator and a solid particulate material that provldes a rough surface topology to the undercoating when dried.
513464
Dynapro Thin Film Products Inc.
Fetherstonhaugh & Co.
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