Sputtered titanium oxynitride films

Details Sputtered titanium oxynitride films Sputtered titanium oxynitride films

C - Chemistry, Metallurgy

23

C

117/158, 204/96.

C23C 16/30 (2006.01) C03C 17/00 (2006.01) C23C 14/06 (2006.01) C23C 14/34 (2006.01)

Patent

CA 1333270

A titanium oxynitride film, and a method for its production are disclosed. A method for making a titanium oxynitride coated article comprises a. placing a substrate in a coating chamber; b. evacuating said chamber; c. providing an atmosphere comprising oxygen and nitrogen in said chamber; d. placing a titanium cathode in said chamber facing a surface of said substrate; e. sputtering said titanium cathode in said atmosphere comprising oxygen and nitrogen in said chamber thereby depositing a titanium oxynitride coating on said surface of said substrate. Other aspects of the invention are also disclosed as for instance coated articles comprising titanium oxynitride in combination with other metal-containing films.

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