Light sensitive diazo compounds, composition and method of...

G - Physics – 03 – C

Patent

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96/161, 260/396.

G03C 1/56 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1259623

ABSTRACT OF THE DISCLOSURE The specification discloses photosensitizers comprising esters of 1-oxo-2-diazo-naphthalene sulfonic acid and 4-benzl-1,2,3-trihydroxoybenzene, photo resists based thereon and methods for making the necessary intermediates and final products. The esters show improved sensitivity to light in the mid UV range.

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