Method for aligning photomasks

Details Method for aligning photomasks Method for aligning photomasks

G - Physics

03

F

33/53

G03F 9/00 (2006.01) H01L 21/00 (2006.01) H01L 21/66 (2006.01) H01L 21/68 (2006.01)

Patent

CA 1296180

METHOD FOR ALIGNING PHOTOMASKS Abstract Photomasks are aligned on opposite sides of a wafer by directing light beams through zone plates in one photomask and through aligned transparent slits on the other photomask. Simultaneous detection of the beams by photodetectors indicates alignment. A method for obtaining precise centering by scanning the slits with the beams, sampling light transmitted through the slits, and fitting the samples to a parabola by the use of a computer is also described.

570949

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