C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/310
C07D 277/38 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1340499
Compounds of the formula: (see fig. I) wherein R2 is a lower alkyl having 4 to 8 carbon atoms, cycloalkyl, lower alkynyl having 2 to 6 carbon atoms, halo(lower)alkyl, carboxy(lower)alkyl or esterified carboxy(lower)alkyl, R6 is amino or protected amino, and R8 is hydrogen or lower alkyl, or the reactive derivatives at the carboxy group or salts thereof. These compounds are useful intermediates for the preparation of cephem or cepham compounds which can be employed for the treatment of infectious diseases caused by pathogenic microorganisms.
616635
Chiba Toshiyuki
Takasugi Hisashi
Takaya Takao
Tsuji Kiyoshi
Astellas Pharma Inc.
Fujisawa Pharmaceutical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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