Apparatus and method for photochemical vapor deposition

Details Apparatus and method for photochemical vapor deposition Apparatus and method for photochemical vapor deposition

H - Electricity

01

L

204/109, 204/91

H01L 21/205 (2006.01) C23C 16/24 (2006.01) C23C 16/48 (2006.01)

Patent

CA 1297831

UD 86-05 APPARATUS AND METHOD FOR PHOTOCHEMICAL VAPOR DEPOSITION Abstract Of The Disclosure A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reac- tion chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone, The window is kept clear by a gas flowing through the flush zone.

524532

Affiliated with

Also associated with

Rating

Apparatus and method for photochemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for photochemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for photochemical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1287326