C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/311
C07D 263/32 (2006.01) C07D 263/40 (2006.01)
Patent
CA 1195986
Abstract of the disclosure: A compound of the formula: Image wherein R1 is (A) a group of the formula, Image wherein R4 is H, a halogen or trifluoromethyl group, or (B) a group of the formula, Image wherein n is O or an interger of 1 to 3; R5 is H or an alkyl group of 1 to 6 carbon atoms; respective R6 and R7 are an alkyl group of 1 to 6 carbon atoms, an alkenyl group of 2 to 6 carbon atoms, a cycloalkyl group of 3 to 7 carbon atoms, or a cycloalkenyl group of 5 to 7 carbon atoms; R6 and R7 may be combined with the neighbouring carbon atom to represent a cycloalkyl group of 3 to 7 carbon atoms; a cycloalkenyl group of 5 to 7 carbon atoms, a bicycloalkyl group of 7 to 10 carbon atoms, or a bicycloalkyl group of 7 to 10 carbon atoms; R2 is an alkyl group of 1 to 6 carbon atoms; and R3 is H, an alkyl group of 1 to 6 carbon atoms or an aralkyl group, or a pharmaceutically acceptable salt thereof. The compound has hypoglycemic, glucose tolerance improving and insulin sensitivity potentiating activities.
429900
Fujita Takeshi
Meguro Kanji
Riches Mckenzie & Herbert Llp
Takeda Chemical Industries Ltd.
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