Semiconductor structure having .alpha. particle resistant...

Details Semiconductor structure having .alpha. particle resistant... Semiconductor structure having .alpha. particle resistant...

H - Electricity

01

L

356/141

H01L 21/312 (2006.01) H01L 23/31 (2006.01) H01L 23/556 (2006.01)

Patent

CA 1229932

ABSTRACT An applique of a prepatterned film of alpha particle resistant material, such as polyamide, is applied to a semiconductor wafer. The prepatterned film covers only the critical areas e.g. those affected by alpha particle impingement. Bond pads and scribe streets are not covered by the applique.

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