Imidyl compounds, polymers therefrom, and use of the polymers

Details Imidyl compounds, polymers therefrom, and use of the polymers Imidyl compounds, polymers therefrom, and use of the polymers

C - Chemistry, Metallurgy

07

D

96/172, 402/219,

C07D 207/452 (2006.01) A61K 49/22 (2006.01) C07D 209/02 (2006.01) C07D 209/52 (2006.01) C08F 22/40 (2006.01) C08F 222/40 (2006.01) G03F 7/038 (2006.01) A61K 38/00 (2006.01)

Patent

CA 1175439

ABSTRACT OF THE DISCLOSURE N-(Hydroxypolyoxaalkylene)-imidyl compounds, methacrylic acid esters thereof, of the formula (I) Image wherein R1 and R2 independently of one another are C1-C4-alkyl, or R1 and R2 together are tri- or tetramethylene which is unsubstituted or substituted by C1-C4-alkyl, R3 is a hydrogen atom or C1-C4-alkyl, n is a number from 2 to 30, and X is a hydrogen atom or CO-CR4=CH2, in which R4 is a hydrogen atom or methyl are described, together with processes for their preparation. The homopolymers and copolymers of these compounds are photosensitive, and are suitable as photographic recording materials. They are also useful as adhesives and surface coating materials. This combination of properties is of advantage in preparing printed circuit boards.

409421

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