Photosensitive film based on silicon-containing polymer and...

Details Photosensitive film based on silicon-containing polymer and... Photosensitive film based on silicon-containing polymer and...

C - Chemistry, Metallurgy

08

F

96/150, 400/5154

C08F 30/08 (2006.01) G03F 7/075 (2006.01)

Patent

CA 1264890

ABSTRACT OF THE DISCLOSURE Photosensitive film usable more particularly in microlithography for producing electronic components. The film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon- containing polymer-based photosensitive film can be used as a masking resin in a lithography process. B 8393.3

491129

Affiliated with

Also associated with

Rating

Photosensitive film based on silicon-containing polymer and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive film based on silicon-containing polymer and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive film based on silicon-containing polymer and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1311181