Method for increasing the band gap in photoresponsive...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148/3.1

H01L 45/00 (2006.01) C23C 14/00 (2006.01) C23C 14/06 (2006.01) C23C 14/32 (2006.01) C23C 16/22 (2006.01) H01L 29/16 (2006.01) H01L 31/0376 (2006.01) H01L 31/20 (2006.01) C23C 16/44 (2006.01)

Patent

CA 1192817

ABSTRACT The production of improved photoresponsive amorphous alloys (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) and devices (142, 168, 178, 192, 198, 212), such as photovoltaic, photoreceptive devices and the like; having improved wavelength threshold characteristics is made possible by adding one or more band yap increasing elements to the alloys (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) and de- vices (142, 168, 178, 192, 198, 212). The in- creasing element or elements are added at least to a portion of the active photoresponsive regions (150, 170, 172, 180, 186, 194, 208, 216) of amor- phous devices (142, 168, 178, 192, 198, 212) con- taining silicon and fluorine, and preferably hy- drogen. One adjusting element is carbon which increases the band gap from that of the materials without the adjusting element incorporated there- in. Other increasing elements can be used such as nitrogen. The silicon and increasing elements are concurrently combined and deposited as amorphous alloys (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) by vapor deposition, sputtering or glow discharge decomposition. The addition of fluorine bonding and electronegativity to the alloy (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) acts as a compensating or altering element to reduce the density of states in the energy gap thereof. The fluorine bond strength allows the band gap increasing element(s) to be added to the alloy (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) to adjust the band gap without reducing the electronic qualities of the alloy (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220). Hydrogen also acts as a compensating or altering element to complement fluorine when utilized therewith. The compensating or altering element(s) can be added during deposition of the alloy (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208) 210, 214, 216, 218, 220) or following deposition. The addition of the increasing element(s) to the alloys (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) increases the band gap to a widened utilization width for a particular device (142, 168, 178, 192, 198, 212) to increase the photoabsorption effi- ciency and to thus enhance the device's photo- responseness without adding states in the gap which decrease the efficiency of the devices (142, 168, 178, 192, 198, 212). The band gap increasing element(s) can be added in varying amounts, in discrete layers or in substantially constant amounts in the alloys (118, 146, 148, 150, 168, 170, 172, 174, 176, 180, 194, 206, 208, 210, 214, 216, 218, 220) and devices (142, 168, 178, 192, 198, 212).

385389

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method for increasing the band gap in photoresponsive... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for increasing the band gap in photoresponsive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for increasing the band gap in photoresponsive... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1311221

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.