C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/172
C08F 2/50 (2006.01) C09D 5/32 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1331533
ABSTRACT (1) A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises: (a) at least one sensitizer selected from the group consisting of a compound of the formula: Image (I) wherein ring A is a substituted or unsubstituted benzene or naphthalene ring, X is a bivalent atom or bivalent group, R1 is an alkyl group, each of R2 and R3 is hydrogen, an alkyl group, an alkoxy group or an alkylthio group, or R1 and R2 bond to each other, and ? is 0, 1 or 2, a compound of the formula: Image (II) wherein R1 and R2 are as defined above, Ar is an aromatic group, and each of n and m is 0 or 1, a compound of the formula: Image (III) wherein R1, R2, R3, ring A, X and ? are as defined above, R is hydrogen, an acetyl group or Image wherein R1, R2, R3 and ? are as defined above, and R5 is an alkyl group, and a compound of the formula: Image (IV) wherein R1, R2, R', X and ? are as defined above, and (b) at least one activator capable of generating active radicals when irradiated in the presence of said sensitizer.
571988
Nagasaka Hideki
Ohta Katsuko
Marks & Clerk
Mitsubishi Chemical Corporation
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