Ellipsometric method and apparatus for studying physical...

G - Physics – 01 – N

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G01N 21/21 (2006.01)

Patent

CA 1258164

ABSTRACT OF THE INVENTION In an ellipsometric method and apparatus which, in order to increase the degree of measuring accuracy, uses the principle of comparative ellipsometry in measuring a characteristic such as a layer thickness, a reference surface is divided into first and second equal surface portions with respectively different reflection characteristics which are in substantially symmetrical relationship to the reflection characteristics of the testpiece, the surface portions preferably comprising two different tapering surface layers extending in parallel relationship to each other.

491057

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