Transparent coatings by reactive sputtering

Details Transparent coatings by reactive sputtering Transparent coatings by reactive sputtering

C - Chemistry, Metallurgy

23

C

204/96.11

C23C 14/06 (2006.01) C03C 17/22 (2006.01) C03C 17/245 (2006.01) C03C 17/34 (2006.01) C03C 17/36 (2006.01) C23C 14/08 (2006.01) C23C 14/10 (2006.01) C23C 14/34 (2006.01)

Patent

CA 1325404

ABSTRACT OF THE DISCLOSURE TRANSPARENT COATINGS BY REACTIVE SPUTTERING A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

557843

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