C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/374
C08F 2/50 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1221496
Abstract of the Disclosure Disclosed is a photocurable composition comprising (a) a radical-polymerizable monomer, (b) an .alpha.-ketocar- bonyl compound and (c) a derivative of mercaptobenzimi- dazole, mercaptobenzothiazole or mercaptobenzoxazole or an aromatic amine nucleus-substituted with an electron-attractive group. This composition has a high photocuring speed at a temperature close to normal temperature and gives a cured product excellent in various physical properties. This composition is valuable as a dental adhesive or resin.
464137
Nakano Takayuki
Sakashita Takeshi
Mitsui Chemicals Incorporated
Smart & Biggar
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