Photocurable compositions

C - Chemistry – Metallurgy – 08 – F

Patent

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C08F 220/20 (2006.01)

Patent

CA 1212687

TITLE: PHOTOCURABLE COMPOSITIONS ABSTRACT OF THE DISCLOSURE A composition useful in photopolymerizable coatings is provided which comprises 50% of a hemi-acrylate having the formula CH2=CHCOOCH2CH2O(CH2CH2CH2O)nCH2CH2OH 27% of a di-acrylate having the formula CH2=CHCOOCH2CH2O(CH2CH2CH2)nCH2CH2OOCCH=CH2 and 23% of a polyether diol having the formula HOCH2CH2O(CH2CH2CH2O)nCH2CH2OH; wherein n is the number of repeating units in the polyether backbone.

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