C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/513
C08F 220/20 (2006.01)
Patent
CA 1212687
TITLE: PHOTOCURABLE COMPOSITIONS ABSTRACT OF THE DISCLOSURE A composition useful in photopolymerizable coatings is provided which comprises 50% of a hemi-acrylate having the formula CH2=CHCOOCH2CH2O(CH2CH2CH2O)nCH2CH2OH 27% of a di-acrylate having the formula CH2=CHCOOCH2CH2O(CH2CH2CH2)nCH2CH2OOCCH=CH2 and 23% of a polyether diol having the formula HOCH2CH2O(CH2CH2CH2O)nCH2CH2OH; wherein n is the number of repeating units in the polyether backbone.
475505
Gowling Lafleur Henderson Llp
Thiokol Corporation
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