Pressure gauge for semiconductor processing

G - Physics – 01 – L

Patent

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G01L 7/04 (2006.01) G01L 19/06 (2006.01)

Patent

CA 2238053

A pressure gauge (35) for semiconductor processing that defines an internal flow path from the socket (36) inlet to the displaceable end (64) of the Bourdon tube (46) that is shelf free so as to be self drainable for internal cleansing and purging whereby to avoid any trapping of contaminants that could subsequently have a deleterious effect on the process.

L'invention concerne un manomètre (35) pour la fabrication de composants à semiconducteur, définissant un trajet d'écoulement interne entre l'orifice d'entrée de la douille (36) et l'extrémité mobile (64) du tube de Bourdon (46). Ledit trajet d'écoulement est dépourvu de plaques internes de façon à permettre une évacuation automatique et faciliter le nettoyage intérieur et la purge. Ce système évite tout piégeage d'impuretés risquant d'avoir un effet nuisible sur le processus.

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