Superconducting device having a reduced thickness of oxide...

H - Electricity – 01 – L

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H01L 39/22 (2006.01) H01L 39/14 (2006.01) H01L 39/24 (2006.01)

Patent

CA 2050731

A superconducting device comprises a substrate having a projection formed in a principal surface and an oxide superconductor thin film formed to cover the projection formed in the principal surface and having a substantially planar surface. The oxide superconductor thin film includes a thinned portion positioned on the projection, a first thick portion positioned at one side of the projection, and a second thick portion positioned at the other side of the projection, so that a superconducting current can flow between the first thick portion and the second thick portion through the thinned portion of the oxide superconductor thin film. For formation of the superconducting device, a substrate having a projection formed on a principal surface thereof is prepared, and an oxide superconductor thin film is formed on the principal surface of the substrate including the projection so that the oxide superconductor thin film has a thickness larger than a height of the projection. Thereafter, a whole of an upper surface of the oxide superconductor thin film is and etched back and planarized so that the oxide superconductor thin film has a planar upper surface and therefore a thickness of the oxide superconductor thin film on the projection is thinner than that of the oxide superconductor thin film on the substrate without the projection.

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