G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/039 (2006.01) C08F 293/00 (2006.01) G03F 7/004 (2006.01)
Patent
CA 2408497
The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block.
La présente invention concerne une nouvelle composition photosensible pour photorésist ainsi qu'un système comprenant un substrat et un photorésist obtenu à partir de cette nouvelle composition. La composition photosensible pour photorésist comprend un copolymère à blocs hydrophobes dont au moins un bloc est un bloc hydrophobe capable de générer un bloc hydrophile et comprenant à son extrémité un groupe choisi parmi les dithioesters, thioethers- thiones, dithiocarbamates et xanthates, et un composé photoactif capable de générer sous l'effet d'un rayonnement une espèce active réagissant avec le bloc hydrophobe pour générer le bloc hydrophile.
Destarac Mathias
Prat Evelyne
Rhodia Chimie
Robic
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