C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/171, 402/223
C08G 69/00 (2006.01) C08G 69/26 (2006.01) C08G 69/42 (2006.01) C08G 73/22 (2006.01) C08L 77/00 (2006.01)
Patent
CA 2010775
ABSTRACT The present invention provides polyamide-polyamide and polybenzoxazole-polyamide polymers derived therefrom with improved processing and film characteristics having incorporated into the polymeric backbone the polymeric condensation residuum of novel aromatic diamino compounds having the formula; Image wherein A is selected from the group consisting of SO2, O, S, CO, C1 to C6 alkyl, perfluoroalkyl or perfluoroalkyl having Prom 1 to 10 carbon atoms and a carbon-carbon double bond directly linking the two aromatic groups and R is selected from the group consisting of hydrogen, hydroxy and C1 to C4 alkoxy. The polyamide-polyamide polymers of this invention are prepared by reacting compounds of the above formula, a, alone or admixed with other aromatic diamines, with one or more aromatic or aliphatic dicarboxylic acids or amide-forming derivatives thereof. Polybenzoxazole-polyamide derivatives of such polyamide-polyamide polymers are prepared utilizing compounds of the above formula wherein R is hydroxy or C1 to C4 alkoxy, and by subjecting the resulting alkoxy or hydroxy-substituted polylamide-polyamide to a dehydrating and cyclizing reaction to form the oxazole linkage which gives rise to polybenzoxazole-polyamide polymer.
Hoechst Celanese Corporation
Khanna Dinesh N.
Smart & Biggar
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