Method for preparing nanocrystalline silicon in sio2 and...

Details Method for preparing nanocrystalline silicon in sio2 and... Method for preparing nanocrystalline silicon in sio2 and...

H - Electricity

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H01L 21/00 (2006.01) B82Y 30/00 (2011.01) H01L 29/02 (2006.01) H01L 29/04 (2006.01)

Patent

CA 2609537

Methods for preparing nanocrystalline-Si/SiO2 composites by treating hydrogen silsesquioxane (HSQ) under reductive thermal curing conditions are described. Also described are methods of preparing silicon nanoparticles by acid etching the nanocrystalline-Si/SiO2 composites.

L'invention concerne des procédés permettant de préparer des composites Si/SiO2 nanocristallins par traitement au silselsquioxane d'hydrogène (HSQ), dans des conditions de polymérisation thermique réductrices. L'invention concerne également des procédés permettant de préparer des nanoparticules de silicium par attaque à l'acide des composites Si/SiO2 nanocristallins.

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