C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/3002, 400/30
C08L 53/00 (2006.01) C08F 287/00 (2006.01)
Patent
CA 2040950
Abstract A method of controlling phase separation in photoinitiated polymerization reactions and products prepared according to the method are the subject of this invention. The method comprises homogenizing a block copolymer and a light polymer- izable monomer prior to exposure of the monomer to the light source which initiates the polymerization reaction. The photosensitive reaction initiating agent may be a substituent group of the monomer, a crosslinker, a photoinitiator or a combination of the foregoing. The method is particularly applicable to preparing sealants, coatings and molded objects where there is a need for a high depth of cure.
Johnson Philip W.
Klausmeyer Kevin K.
Stevenson William T. K.
Yin Xiaonan
Koch Protective Treatments Inc.
Smart & Biggar
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