Photostable sunscreen composition comprising a...

C - Chemistry – Metallurgy – 07 – C

Patent

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C07C 49/784 (2006.01) A61K 31/12 (2006.01) A61P 17/16 (2006.01) C07C 45/90 (2006.01) C07C 49/84 (2006.01)

Patent

CA 2201959

This invention consists of a new photostable cosmetic composition for protecting skin and/or hair against ultraviolet radiation. It comprises, in a cosmetically acceptable matrix, at least one dibenzoylmethane derivative as an active UV-A screen and at least one polysaccharide alkylether formed of patterns of at least two different saccharide cycles, each pattern having at least one hydroxyl group replaced by a saturated hydrocarbon alkyl chain as a stabilizing agent for the screen. It also includes the corresponding photostabilization process and the application of the composition to skin and hair to protect against the effects of ultraviolet radiation.

L'invention se rapporte à une nouvelle composition cosmétique photostable pour la photoprotection de la peau et/ou des cheveux contre le rayonnement ultraviolet comprenant, dans un support cosmétiquement acceptable, au moins un dérivé du dibenzoylméthane à titre de filtre actif dans l'UV-A et au moins un alkyléther de polysaccharide formé de motifs comportant au moins deux cycles osidiques différents, chaque motif comportant au moins un groupe hydroxyle substitué par une chaîne alkyle hydrocarbonée saturée, à titre d'agent stabilisant dudit filtre. Elle se rapporte également au procedé de photostabilisation correspondant et à l'application de cette composition à la protection de la peau et des cheveux contre les effets du rayonnement ultraviolet.

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