C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 333/06 (2006.01) A61K 31/38 (2006.01) A61K 31/395 (2006.01) C07D 207/32 (2006.01) C07D 213/04 (2006.01) C07D 233/56 (2006.01) C07D 261/08 (2006.01) C07D 263/32 (2006.01) C07D 275/02 (2006.01) C07D 277/22 (2006.01) C07D 333/08 (2006.01) C07D 333/16 (2006.01) C07D 333/18 (2006.01) C07D 333/24 (2006.01) C07D 409/02 (2006.01)
Patent
CA 2114641
ABSTRACT This invention relates to a substituted hetero- cyclic derivative represented by the general formula Image [I] wherein R denotes a 5- or 6-membered heterocyclic group containing one or two hetero atoms selected from the group consisting of nitrogen atoms, oxygen atoms and sulfur atoms; Q1 denotes a group repre- sented by the formula Image , a group represented by the formula Image , a group represented by the formula -CH=CH-CH2-, a group represented by the formula -CH2-CH=CH-, a group represented by the formula -CH2-O-CH2- or a trimethylene group; X and Y are the same or differ- ent and each represent a methylene group, an oxygen atom or a sulfur atom, or they combine to denote a vinylene group or an ethynylene group; Q2 denotes (a) a 5- or 6-membered aromatic ring group repre- sented by the formula Image wherein A, B, D and E each denote a nitrogen atom, an oxygen atom, a sulfur atom or a group represented by the formula =CH-, and p is an integer of 0 or 1, (b) a group represented by the formula -F-G-I- wherein F, G and I are the same or different, and each represent an oxygen atom, a sulfur atom, a methylene group or a group repre- sented by the formula -CH=; R1 denotes a lower alkyl group, a lower alkenyl group, a lower hydroxyalkyl group, a lower alkoxy- alkyl group, a lower alkanoyloxyalkyl group or a lower alkylthioalkyl group; ???? denotes a single bond or double bond provided that in the case of the single bond it is a group formed by addition of two hydrogen atoms to the corresponding double bond; Q3 denotes an ethylene group, a vinylene group or an ethynylene group; Q4 denotes a vinylene group or an ethynylene group; R2 and R3 are the same or different and denote lower alkyl groups, or they combine to denote a group forming a cycloalkane together with the adjacent carbon atom; and R4 denotes a hydrogen atom, a lower alkyl group or a lower alkoxy group.
Hayashi Masahiro
Kamei Toshio
Mitsuya Morihiro
Nomoto Takashi
Nonoshita Katsumasa
Banyu Pharmaceutical Co. Ltd.
Smart & Biggar
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