Semiconductor component with linear current-to-voltage...

H - Electricity – 01 – L

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H01L 29/78 (2006.01) H01L 29/06 (2006.01) H01L 29/739 (2006.01)

Patent

CA 2261719

A semiconductor device is disclosed to obtain linear current-to-voltage characteristics through the origin of coordinates and additionally combined with a bi-directional structure. The typical device contains an oxide layer (20) on top of a p- doped substrate (10). On top of this oxide layer a n-type drift region (30) is created which forms a longitudinal n-drift region. The n- drift region comprises at each end a low doped p-type well (32) which has a portion (31) with strongly doped p+ semiconductor material which will constitute contacting to either a source or a drain electrode (35). Each p- type well (32) additionally contains a n+ area (33) and additionally on top of said p-type well a gate electrode (34), whereby the n+ doped area (33) is positioned in the p-well (32) between a gate and a drain electrode or a gate and a source electrode, respectively. Thus a bi-directional double DMOS structure is created having a common drift region.

L'invention porte sur un dispositif à semi-conducteur à caractéristiques courant/tension linéaires depuis l'origine des coordonnées et en outre combiné à une structure bidirectionnelle. Le dispositif type comporte une couche d'oxyde (20) recouvrant un substrat (10) à dopage p?-¿. Au-dessus de la couche d'oxyde est créée une zone de migration de type n?-¿ (30) qui constitue une zone de migration de type n?-¿ longitudinale. Ladite zone comporte à chacune de ses extrémités un puits de type p?-¿ faiblement dopé (32) comportant une partie (31) d'un matériau semi-conducteur à fort dopage p?+¿ assurant le contact soit avec une électrode (35) source soit avec une électrode drain. Chacun des puits de type p?-¿ (32) comporte de plus une zone à dopage n?+¿ (33), et une électrode grille (34) le recouvrant, la zone à dopage n?+¿ (33) étant placée dans le puits p?-¿ (32) entre une grille et une électrode drain, ou entre une grille et une électrode source. On crée ainsi une structure bidirectionnelle double DMOS à zone de migration commune.

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