Apparatus and method for coating a substrate using vacuum...

Details Apparatus and method for coating a substrate using vacuum... Apparatus and method for coating a substrate using vacuum...

B - Operations, Transporting

05

B

B05B 5/06 (2006.01) B05B 5/08 (2006.01) B05B 12/00 (2006.01) C23C 14/32 (2006.01) C23C 14/35 (2006.01)

Patent

CA 2061809

An apparatus and method are described for depositing a coating onto a substrate using vacuum arc evaporation from a substantially cylindrical cathode. An axial magnetic field is disclosed to force the motion of the arc into an open helical trajectory on the cathode surface. Means are also provided for controlling the speed and direction of the arc along the cathode by varying the division of input current between the ends of the cathode. Improved uniformity of cathode erosion and coating thickness are thereby achieved, along with a reduction in the number and size of splattered droplets incorporated into the coating.

Affiliated with

Also associated with

Rating

Apparatus and method for coating a substrate using vacuum... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for coating a substrate using vacuum..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for coating a substrate using vacuum... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1511307