C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 231/16 (2006.01) A01N 43/48 (2006.01) A01N 43/56 (2006.01) A01P 3/00 (2006.01) C07D 231/14 (2006.01)
Patent
CA 2301093
The invention relates to biphenylamides having general formula (I), and their salts, in which R1 is H or F; R2 is H, halogen, alkyl, halogen methyl, alkoxy, alkylthio; R3 is CH3, CHF2, CF3. The invention also relates to agents containing biphenylamides, the production of biphenylamides and their use in combating parasitic fungus.
L'invention concerne des biphénylamides de la formule générale (I), ainsi que leurs sels, formule dans laquelle R<1> = H ou bien F; R<2> = H, halogène, alkyl, halogéniure de méthyle, alcoxy, alkylthio; R<3> = CH3, CH2, CF3, ainsi que des agents contenant ces biphénylamides, la préparation de ces derniers et des agents, ainsi que leur utilisation pour lutter contre les champignons parasites.
Ammermann Eberhard
Eicken Karl
Lorenz Gisela
Rack Michael
Strathmann Siegfried
Basf Aktiengesellschaft
Robic
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