C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 249/08 (2006.01) A61K 31/4196 (2006.01) A61P 25/00 (2006.01) C07D 233/64 (2006.01) C07D 403/10 (2006.01)
Patent
CA 2314009
The present invention relates to compounds of the general formula (see formula I) wherein R1 - R4 signify independently hydrogen, -CF3, -OCF3, OCHF2, -OCH2F, lower alkyl, lower alkoxy, halogen, hydroxy, phenyl, benzyl, amino, nitro, pyrrol-1-yl, lower alkyl-sulfonyl, lower alkyl-sulfanyl, cyano or benzyloxy; or R2 and R3 may be together -O-(CH2)2-O-, -O-CH2-O-, -O-(CH2)2-, -(CH2)3- or -CH=CH-CH=CH-; X signifies -N=, -N(R8)- or -CH=; Y signifies -N=, =N-, -N(R8)- or -CH=; wherein one of X or Y has to be nitrogen; R5 signifies the group Image wherein R6 and R7 signify independently from each other hydrogen, lower alkyl, -C(O)- lower alkyl, hydroxy-lower alkyl, lower alkenyl, -C(O)CH2OH or R6 and R7 may be together with the N-atom -(CH2)n-, -(CH2)2-O-(CH2)2-, -CH2-CH=CH-CH2, -CH2-CH[OC(O)CH3]-(CH2)2, -CH2-CH[NHC(O)CH3]-(CH2)2, -O-(CH2)3-, -CH2-CH(OCH3)-(CH2)2-, -CH2-CH(halogen)-(CH2)2-, -(CH2)2-CH(O-phenyl)-(CH2)2-, -(CH2)2-N(CHO)-(CH2)2-, -(CH2)2-N(COCH3)-(CH2)2-, -CH2-CH(OH)-(CH2)3-, -(CH2)2-CH(OH)-(CH2)2- or -(CH2)2-N(benzyl)-CH2)2-; n signifies 3 to 5; and R8 signifies hydrogen, lower alkyl, lower alkenyl, lower alkinyl, -(CH2)m-O- lower alkyl, -(CH2)m-OH, -(CH2)m-CHF2, -(CH2)m-CH2F, -(CH2)m-C(O)-lower alkyl, -(CH2)m-C(O)O-lower alkyl, -(CH2)m-CH(OH)-lower alkyl, -(CH2)m-CH(OH)-(CH2)m OH, -(CH2)m-C6H5, which phenyl ring is optionally substituted by lower alkyl, lower alkoxy or hydroxy, -(CH2)m-C(=CH2)-lower alkyl, -(CH2)m-cycloalkyl, -(CH2)m-CN, -(CH2)m-pyridin-4-yl, -(CH2)m-pyridin-3-yl or -(CH2)m-pyridin-2-yl; m signifies 0 to 4; and to their pharmaceutically acceptable acid addition salts. These compounds may be used for the treatment of diseases related to the NMDA receptor subtype selective blockers.
Alanine Alexander
Buttelmann Bernd
Heitz Neidhart Marie-Paule
Jaeschke Georg
Pinard Emmanuel
Borden Ladner Gervais Llp
F. Hoffmann-La Roche Ag
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