Nanoimprint lithograph for fabricating nanoadhesive

Details Nanoimprint lithograph for fabricating nanoadhesive Nanoimprint lithograph for fabricating nanoadhesive

B - Operations, Transporting

82

B

B82B 3/00 (2006.01) B29C 39/10 (2006.01) G03F 7/00 (2006.01)

Patent

CA 2518642

A nanoimprint lithography method of fabricating a nanoadhesive includes steps of (a) preparing a substrate and a mold under the vacuum environment, wherein at least one of the substrate and the mold is transparent, the mold is located over the substrate and has an oppressing portion having nanometer-scale features and a mold release agent located on the surface of the nanometer-scale features; (b) coating a liquid resist cast on the substrate, wherein the resist cast can be hardened by ultraviolet rays; (c) having the mold is pressed on the substrate to enable the resist cast to fill between the manometer-scale features and the substrate; (d) irradiating the resist cast by the ultraviolet rays for hardening; and (e) releasing the mold from the substrate to enable the resist cast to produce a contrast pattern thereon corresponding to the manometer-scale features, wherein the resist cast with the contrast pattern is the nanoadhesive.

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