B - Operations – Transporting – 23 – K
Patent
B - Operations, Transporting
23
K
B23K 10/00 (2006.01) H01J 37/32 (2006.01) H05H 1/18 (2006.01)
Patent
CA 2182342
A method for selective controlled etching of a material particularly by sequentially switching between two (2) or more modes of radiofrequency waves and/or by distance from a source of the microwaves. The modes and/or distance are selected depending upon the surface of the material to be etched. The etching is rapidly conducted at 0.5 mtorr to 10 torr, preferably using microwave plasma etching.
Asmussen Jes
Chakraborty Rabindra N.
Goldman Paul D.
Reinhard Donnie K.
Board Of Trustees A. Constitutional Corporation Operating Michigan State Universit
Macrae & Co.
Saint-Gobain/norton Industrial Ceramics Corporation
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