C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 231/10 (2006.01) A61K 31/415 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 231/12 (2006.01) C07D 231/14 (2006.01) C07D 231/16 (2006.01) C07D 401/02 (2006.01) C07D 403/02 (2006.01) C07D 405/04 (2006.01) C07D 413/02 (2006.01) C07D 417/02 (2006.01)
Patent
CA 2088835
ABSTRACT OF THE DISCLOSURE Compounds of the formula: Image wherein: R1 is aryl substituted with substituent(s) selected from the group consisting of lower alkyl- thio, cyclo(lower)alkyl, hydroxy, hydroxy(lower)- alkyl, cyano, lower alkylenedioxy, acyl, acyloxy, aryloxy and lower alkoxy optionally substituted with acyl or lower alkoxy, R2 is halogen, halo(lower)alkyl, cyano or acyl, and R3 is aryl substituted with nitro, hydroxy, lower alkoxy, lower alkylthio, lower alkylsulfinyl or lower alkylsulfonyl, provided that when R3 is aryl substituted with nitro, hydroxy or lower alkoxy, then R1 is aryl substituted with lower alkylthio, lower alkylsulfinyl or lower alkylsulfonyl, and pharmaceutically acceptable salts thereof. The disclosure also describes the preparation of the compounds pharmaceutical compositions containing them and their uses in the therapeutic treatment and/or prevention of inflammatory conditions, various pains, collagen diseases, auto immune diseases or various immunity diseases.
Konishi Nobukiyo
Matsuo Masaaki
Ogino Takashi
Tsuji Kiyoshi
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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