Method for making a multilevel circuitry comprising...

H - Electricity – 05 – K

Patent

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H05K 3/46 (2006.01) H05K 3/00 (2006.01) H05K 3/10 (2006.01) H05K 3/18 (2006.01)

Patent

CA 2433222

The invention concerns a method for making an multilevel interconnection circuitry comprising conductor tracks and micro-vias. The method for producing at least one of the levels comprises the following steps: a) on a substrate including at its surface metallizable and/or potentially metallizable parts (102), forming a first insulating photosensitive resin layer (103) comprising a compound capable of inducing subsequent metallization; b) exposing and revealing the first layer (103) so as to selectively uncover the metallizable and/or potentially metallizable parts (102) of the substrate; c) forming, by metallization, metal conductor tracks (111) and micro-vias (110) at the surface of the first insulating photosensitive resin layer (113) and of the parts uncovered during step b), by providing a second photosensitive resin layer (105) forming a selective protection, the second photosensitive resin layer (105) being eliminated.

L'invention concerne un procédé de fabrication d'une circuiterie d'interconnexion à plusieurs niveaux comprenant des pistes et des microtraversées. Le procédé comprend, pour la réalisation d'au moins un des niveaux les étapes suivantes: a) Sur un substrat présentant à sa surface des parties métallisables et/ou potentiellement métallisables, formation d'une première couche de résine photosensible isolante comprenant un composé susceptible d'induire une métallisation ultérieureb) insolation et révélation de la première couche de manière à sélectivement découvrir des parties métallisables et/ou potentiellement métallisables du substrat c) formation, par métallisation, de pistes et de microtraversées métalliques à la surface de la première couche de résine photosensible isolante et des parties découvertes lors de l'étape b), avec mise en oeuvre d'une deuxième couche de résine photosensible formant une protection sélective,la deuxième couche de résine photosensible étant éliminée.

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