C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 233/92 (2006.01) A01N 37/26 (2006.01) A01N 37/30 (2006.01) A01N 37/38 (2006.01) A01N 37/40 (2006.01) A01N 37/46 (2006.01) C07C 235/88 (2006.01) C07C 255/60 (2006.01)
Patent
CA 2053402
O.Z.0050/41955 Abstract of the Disclosure: Fumaramic acid derivatives of the formula Image where A is O-R3 or NR4R5, where R3, R4 and R5 are each hydrogen, alkyl, alkenyl, alkynyl or substituted or unsubstituted aralkyl, R1 and R2 are each hydrogen or alkyl, or R1 and R2 together form a methylene chain, Ar is unsubstituted or substituted aryl, n is 0 - 3, are used in fungicides.
Ammermann Eberhard
Franke Claudia
Keil Michael
Krohn Karsten
Lorenz Gisela
Basf Aktiengesellschaft
Robic
LandOfFree
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