Superconductive optoelectronic devices with the basic...

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H01L 39/10 (2006.01) H01L 29/772 (2006.01) H01L 31/112 (2006.01) H01L 39/12 (2006.01) H01L 39/14 (2006.01)

Patent

CA 2048392

The disclosed superconductive optoelectronic device with the basic substance Bi2O3 or Bi2O3;M2+ (M=Ca,Sr,Cu) of superconductive-conjugate photoconductivity has a substrate, a photoconductive gate region formed on the substrate, and a source region and a drain region formed on the substrate at opposite sides of the gate region so as to face toward each other across the gate region. The source region and the drain region are made of a Bi-based superconductive material. The gate region is made of such the basic material Bi2O3 or Bi2O3;M2+ (M=Ca,Sr,Cu) of superconductive-conjugate photoconductivity, which reveals photoconductivity at a temperature below the transition temperature of the above relevant Bi-based superconductive material. Also disclosed are superconductive optoelectronic devices formed of an organized integration of the above superconductive optoelectronic devices to develop effectively a new field of "Superconductive Optoelectronics".

Dispositif optoélectronique à supraconduction avec le composé basique Bi2O3 ou Bi2O3;M2+ (M = Ca, Sr, Cu) avec photoconductivité à supraconduction conjuguée, ayant un substrat, une région de grille photoconductrice appliquée au substrat et une source et une région de drain appliquées sur le substrat aux côtés éloignés de la région de grille, de sorte qu'elles se font face de part et d'autre de la région de grille. La source et la région de drain sont composées d'un matériel supraconducteur à base de bismuth. La région de grille est composée de matériel basique tel que le Bi2O3 ou Bi2O3;M2+ (M = Ca, Sr, Cu) avec photoconductivité à supraconduction conjuguée, qui affiche de la photoconductivité à une température inférieure à la température de transition du matériel supraconducteur à base de bismuth pertinent ci-dessus. Également dispositifs optoélectroniques à supraconduction formés par intégration organisée des dispositifs optoélectronique à supraconduction ci-dessus pour créer effectivement un nouveau champ «d'optoélectronique à supraconduction».

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