C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/177, 260/281
C07D 215/14 (2006.01) C07D 219/02 (2006.01) C07D 221/16 (2006.01) G03F 7/031 (2006.01)
Patent
CA 2006073
Abstract of the Disclosure Compounds of the general formula I Image (I) are described in which R1 is a group of the formula Image and R2 is a hydrogen atom or a methyl group, or R1 and R2 jointly form an optionally substituted 5- or 6-membered ring, R3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group, R4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula Image n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH2OA, CH2NHA or C2H4OA, and A is an acryloyl or methacryloyl group, the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.
Frommeld Hans-Dieter
Steppan Hartmut
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
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