C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
202/80
C08G 18/10 (2006.01) C07C 269/08 (2006.01) C08G 18/76 (2006.01)
Patent
CA 2025691
A wiped film evaporation process for reducing the amount of residual toluene diisocyanate in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.
Machado Reinaldo M.
Siuta Albert J.
Starner William E.
Toseland Bernard A.
Air Products And Chemicals Inc.
Mcfadden Fincham
LandOfFree
Preparation of urethane prepolymers having low levels of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Preparation of urethane prepolymers having low levels of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of urethane prepolymers having low levels of... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1683896