Plasma deposited film networks

Details Plasma deposited film networks Plasma deposited film networks

C - Chemistry, Metallurgy

08

J

C08J 7/18 (2006.01) B05D 1/36 (2006.01) B05D 7/00 (2006.01) B05D 7/24 (2006.01) B32B 27/16 (2006.01) C08F 8/00 (2006.01) H05B 6/46 (2006.01)

Patent

CA 2213328

A three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three- dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks significantly increases the surface functional density.

Réseau de film fonctionnel tridimensionnel comprenant une pluralité de couches de films plasma à décharge haute fréquence. Les couches de films plasma comprennent une première couche renfermant une pluralité de premiers groupes fonctionnels, et une seconde couche renfermant une pluralité de seconds groupes fonctionnels. L'utilisation de réseaux de films tridimensionnels pourvus de groupes fonctionnels désirés placés soit sur la périphérie, soit à la fois sur la périphérie et des espaces interstitiels des réseaux accroît la densité fonctionnelle de la surface.

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