Method of preparing oxide superconducting thin film

Details Method of preparing oxide superconducting thin film Method of preparing oxide superconducting thin film

H - Electricity

01

L

117/72, 117/81,

H01L 39/24 (2006.01) C23C 14/02 (2006.01) C23C 14/08 (2006.01) H01B 12/06 (2006.01)

Patent

CA 2038601

When an oxide superconducting thin film is formed on a substrate by a vapor phase method such as laser ablation, for example, a plurality of grooves are formed on the substrate by photolithography or beam application in the same direction with an average groove-to-groove pitch of not more than 10 µm, so that the oxide superconducting thin film is formed on a surface provided with such a plurality of grooves. Thus promoted is growth of crystals of the oxide superconducting thin film in parallel with the grooves, whereby respective directions of a-axes and c-axes are regulated to some extent. This improves critical current density of the oxide superconducting thin film.

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